Published July 6, 2015 | Version v1
Journal article

Interface engineering in epitaxial growth of layered oxides via a conducting layer insertion

  • 1. Department of Materials Science and Engineering, University of Science and Technology of China, Hefei 230026, Anhui (China)
  • 2. Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, Anhui (China)
  • 3. Synergetic Innovation Center of Quantum Information and Quantum Physics, University of Science and Technology of China, Hefei 230026, Anhui (China)
  • 4. Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433-7707 (United States)

Description

There is a long-standing challenge in the fabrication of layered oxide epitaxial films due to their thermodynamic phase-instability and the large stacking layer number. Recently, the demand for high-quality thin films is strongly pushed by their promising room-temperature multiferroic properties. Here, we find that by inserting a conducting and lattice matched LaNiO3 buffer layer, high quality m = 5 Bi6FeCoTi3O18 epitaxial films can be fabricated using the laser molecular beam epitaxy, in which the atomic-scale sharp interface between the film and the metallic buffer layer explains the enhanced quality. The magnetic and ferroelectric properties of the high quality Bi6FeCoTi3O18 films are studied. This study demonstrates that insertion of the conducting layer is a powerful method in achieving high quality layered oxide thin films, which opens the door to further understand the underline physics and to develop new devices

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
107
Journal Issue
1
Journal Page Range
p. 011602-011602.4
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47053122
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
BUFFERS; FABRICATION; FERROELECTRIC MATERIALS; INSTABILITY; INTERFACES; LASERS; LAYERS; MOLECULAR BEAM EPITAXY; OXIDES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS
Descriptors DEC
CHALCOGENIDES; CRYSTAL GROWTH METHODS; DIELECTRIC MATERIALS; EPITAXY; FILMS; MATERIALS; OXYGEN COMPOUNDS; TEMPERATURE RANGE

Optional Information

Notes
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