Published 2000
| Version v1
Miscellaneous
Reduction of inter lamellar distance of induced silica by application of pressure
- 1. Universidade Estadual de Campinas, SP (Brazil). Inst. de Quimica
- 2. Roraima Univ., Boa Vista, RR (Brazil). Dept. de Quimica
Description
no abstract available
Additional details
Additional titles
- Original title (Portuguese)
- Reducao da distancia interlamelar de silica induzida por aplicacao de pressao
Publishing Information
- Imprint Title
- The chemical link Brazil/Portugal. Abstracts of the 23. annual meeting of the Brazilian Chemical Society. v. 1
- Imprint Pagination
- 325 p.
- Journal Page Range
- p. 237
Conference
- Title
- 23. annual meeting of the Brazilian Chemical Society
- Original Conference Title
- 23. reuniao anual da Sociedade Brasileira de Quimica
- Dates
- 23-26 May 2000
- Place
- Pocos de Caldas, MG (Brazil)
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 32002090
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- CADMIUM IONS; DOPED MATERIALS; LAMELLAE; MERCURY IONS; PRESSURE MEASUREMENT; SILICON OXIDES; SOL-GEL PROCESS; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; COHERENT SCATTERING; DIFFRACTION; IONS; MATERIALS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; SILICON COMPOUNDS
Optional Information
- Notes
- 7 refs., 2 figs, 1 tab. Imprint:A ligacao quimica Brasil/Portugal. Resumos da 23. reuniao anual da Sociedade Brasileira de Quimica. v. 1