Microstructural characterization of titanium oxide thin films deposited on oblong alumina tubes by magnetron sputtering

Full text: Titanium oxide thin films were deposited on Alumina 96% oblong ceramic tubes using magnetron sputtering process. These tubes will be part of the new synchrotron accelerator Sirius, having an important role liberating static charges during electron beam travel. Argon plasma was used during the deposition, and synthetic air flow was injected at the end of the process in order to oxide and stabilize the film resistance. Aiming the improvement of the process, several sputtering conditions were tested. The thin film resistance values obtained are in accordance with the project specifications. At the end, microstructural characterizations were made using Scanning Electron Microscopy - SEM and X-ray Photoelectron Spectroscopy - XPS. Thickness measurements of the deposited film were also made on several points along the length and width of the tube. (author)