Published November 1990 | Version v1
Journal article

Formation of multicomponent metalloxide thin films by reactive ion-beam sputtering

  • 1. AN Belorusskoj SSR, Minsk (Belarus). Inst. Fiziki Tverdogo Tela i Poluprovodnikov

Description

The process of SrTiO3,BaTiO3 and Y3F5O12 film formation through sputtering the targets made of the mixtures of corresponding oxide and carbonate powders in oxygen by 1.2 keV oxygen ion beam is studied. The composition of the targets and parameters of their sputtering are determined for producing homogeneous in thickness (60-300 nm) films of stoichiometric composition over the area of 80 cm2 maximum. Electrophysical characteristics of films are given

Additional details

Additional titles

Original title (Russian)
Формирование тонких пленок многокомпонентных металлоксидов методом реактивного ионно-лучевого распыления

Publishing Information

Journal Title
Pis'ma v Zhurnal Tekhnicheskoj Fiziki
Journal Volume
16
Journal Issue
21
Series
Pis'ma Zh. Tekh. Fiz.
Journal Page Range
65-69
ISSN
0320-0116
CODEN
PZTFD