Published 2014 | Version v1
Journal article

Deep sub micrometer imaging of defects in copper pillars by X-ray tomography in a SEM

  • 1. CEA, DRT-LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, (France)
  • 2. STMicroelectronics, 850 rue Jean Monnet, 38926 Crolles, (France)

Description

The potential of X-ray nano-tomography hosted in a SEM in presented in this paper. In order to improve the detail detectability of this system, which is directly related to the X-ray source size, thin metal layers have been studied and installed in the equipment. A 3D resolution pattern has been created in order to determine the smallest detectable features by this setup. This sample is a 25 m diameter copper pillar in which size-controlled holes have been milled using a plasma-focused ion beam. This pattern has then been scanned and the resulting 3D reconstruction demonstrates that the instrument is able to detect 500 nm diameter voids in a copper interconnection, as used in 3D integration. (authors)

Availability note (English)

Available from doi: http://dx.doi.org/10.1016/j.micron.2013.10.014

Additional details

Identifiers

Publishing Information

Journal Title
Micron (1993)
Journal Volume
58
Journal Page Range
p. 1-8
ISSN
0968-4328

Optional Information

Notes
37 refs.