Published February 28, 2017 | Version v1
Journal article

Laser-induced superhydrophobic grid patterns on PDMS for droplet arrays formation

  • 1. Ingram School of Engineering, Texas State University, San Marcos, TX 78666 (United States)
  • 2. Materials Science, Engineering and Commercialization, Texas State University, San Marcos, TX 78666 (United States)
  • 3. Department of Materials Science and Engineering, Yonsei University, Seoul 03722 (Korea, Republic of)

Description

Highlights: • Superhydrophobic grid patterns were processed on the surface of PDMS using a pulsed nanosecond laser. • Droplet arrays form instantly on the laser-patterned PDMS with the superhydrophobic grid pattern when the PDMS sample is simply immersed in and withdrawn from water. • Droplet size can be controlled by controlling the pitch size of superhydrophobic grid and the withdrawal speed. - Abstract: We demonstrate a facile single step laser treatment process to render a polydimethylsiloxane (PDMS) surface superhydrophobic. By synchronizing a pulsed nanosecond laser source with a motorized stage, superhydrophobic grid patterns were written on the surface of PDMS. Hierarchical micro and nanostructures were formed in the irradiated areas while non-irradiated areas were covered by nanostructures due to deposition of ablated particles. Arrays of droplets form spontaneously on the laser-patterned PDMS with superhydrophobic grid pattern when the PDMS sample is simply immersed in and withdrawn from water due to different wetting properties of the irradiated and non-irradiated areas. The effects of withdrawal speed and pitch size of superhydrophobic grid on the size of formed droplets were investigated experimentally. The droplet size increases initially with increasing the withdrawal speed and then does not change significantly beyond certain points. Moreover, larger droplets are formed by increasing the pitch size of the superhydrophobic grid. The droplet arrays formed on the laser-patterned PDMS with wettability contrast can be used potentially for patterning of particles, chemicals, and bio-molecules and also for cell screening applications.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2016.10.153

Additional details

Identifiers

DOI
10.1016/j.apsusc.2016.10.153;
PII
S0169-4332(16)32277-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
396
Journal Page Range
p. 359-365
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48077868
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
DEPOSITION; DROPLETS; IRRADIATION; LASER RADIATION; NANOSTRUCTURES; SCREENING; SURFACES; WATER; WETTABILITY
Descriptors DEC
ELECTROMAGNETIC RADIATION; HYDROGEN COMPOUNDS; OXYGEN COMPOUNDS; PARTICLES; RADIATIONS

Optional Information

Copyright
Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.