Published July 1, 2020 | Version v1
Journal article

Photoresponsive characteristics of thin film transistors with perovskite quantum dots embedded amorphous InGaZnO channels

  • 1. State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433 (China)

Description

Photodetectors based on amorphous InGaZnO (a-IGZO) thin film transistor (TFT) and halide perovskites have attracted attention in recent years. However, such a stack assembly of a halide perovskite layer/an a-IGZO channel, even with an organic semiconductor film inserted between them, easily has a very limited photoresponsivity. In this article, we investigate photoresponsive characteristics of TFTs by using CsPbX 3 (X = Br or I) quantum dots (QDs) embedded into the a-IGZO channel, and attain a high photoresponsivity over 103A⋅W−1, an excellent detectivity in the order of 1016 Jones, and a light-to-dark current ratio up to 105 under visible lights. This should be mainly attributed to the improved transfer efficiency of photoelectrons from the QDs to the a-IGZO channel. Moreover, spectrally selective photodetection is demonstrated by introducing halide perovskite QDs with different bandgaps. Thus, this work provides a novel strategy of device structure optimization for significantly improving the photoresponsive characteristics of TFT photodetectors. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/ab9738

Additional details

Identifiers

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
29
Journal Issue
7
Journal Page Range
[8 p.]
ISSN
1674-1056