Published March 1996 | Version v1
Journal article

Formation of rectilinearly wide plasmas by a slotted waveguide under electron cyclotron resonance

  • 1. Faculty of Engineering, Toyama Prefectural University, Kosugi-machi, Toyama 939-03 (Japan)
  • 2. Research and Development Division, ShinMaywa Industries Ltd., Nishinomiya-shi, Hyogo 663 (Japan)

Description

A plasma source was developed for ion implanters capable of irradiating large-area substrates. Microwave discharge is performed by electron cyclotron resonance (ECR). A rectilinearly wide flux of magnetic induction is formed with two long permanent magnets with oppositely facing poles. The ECR zone formed inside a vacuum chamber is elongated in the direction along the pole faces. A waveguide slotted along its E plane is inserted between the magnets. The long slot radiates microwaves into the vacuum chamber through dielectric materials. These materials play the role of waveguide. Plasmas are uniformly generated in the direction along the slotted waveguide when it is terminated with a short plunger. This mechanism is analyzed by calculating radiation patterns of the slotted waveguide. copyright 1996 American Institute of Physics

Additional details

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
67
Journal Issue
3
Journal Page Range
p. 997-999.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
6. international conference on ion sources.
Dates
10-16 Sep 1995.
Place
Whistler (Canada).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
28003637
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; HIGH-FREQUENCY DISCHARGES; MAGNETIC FIELD CONFIGURATIONS; MICROWAVE RADIATION; PERMANENT MAGNETS; PLASMA PRODUCTION; WAVEGUIDES
Descriptors DEC
CYCLOTRON RESONANCE; ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; EQUIPMENT; MAGNETS; RADIATIONS; RESONANCE

Optional Information

Secondary number(s)
CONF-9509125--.