Formation of rectilinearly wide plasmas by a slotted waveguide under electron cyclotron resonance
- 1. Faculty of Engineering, Toyama Prefectural University, Kosugi-machi, Toyama 939-03 (Japan)
- 2. Research and Development Division, ShinMaywa Industries Ltd., Nishinomiya-shi, Hyogo 663 (Japan)
Description
A plasma source was developed for ion implanters capable of irradiating large-area substrates. Microwave discharge is performed by electron cyclotron resonance (ECR). A rectilinearly wide flux of magnetic induction is formed with two long permanent magnets with oppositely facing poles. The ECR zone formed inside a vacuum chamber is elongated in the direction along the pole faces. A waveguide slotted along its E plane is inserted between the magnets. The long slot radiates microwaves into the vacuum chamber through dielectric materials. These materials play the role of waveguide. Plasmas are uniformly generated in the direction along the slotted waveguide when it is terminated with a short plunger. This mechanism is analyzed by calculating radiation patterns of the slotted waveguide. copyright 1996 American Institute of Physics
Additional details
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 67
- Journal Issue
- 3
- Journal Page Range
- p. 997-999.
- ISSN
- 0034-6748
- CODEN
- RSINAK
Conference
- Title
- 6. international conference on ion sources.
- Dates
- 10-16 Sep 1995.
- Place
- Whistler (Canada).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 28003637
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; HIGH-FREQUENCY DISCHARGES; MAGNETIC FIELD CONFIGURATIONS; MICROWAVE RADIATION; PERMANENT MAGNETS; PLASMA PRODUCTION; WAVEGUIDES
- Descriptors DEC
- CYCLOTRON RESONANCE; ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; EQUIPMENT; MAGNETS; RADIATIONS; RESONANCE
Optional Information
- Secondary number(s)
- CONF-9509125--.