Modification of WS2 nanosheets with controllable layers via oxygen ion irradiation
Creators
- 1. School of Physics, Key Laboratory of Particle Physics and Particle Irradiation (MOE), Shandong University, Jinan, 250100 (China)
Description
Highlights: • The layer numbers of WS2 nanosheets can be controlled with ion irradiation. • Controllable optical band gap achieved after ion irradiation. • Irradiation did not change the 2H-WS2 phase structure of the WS2 nanosheets. • Some properties can be conserved for potential applications after irradiation. As one kind of two-dimensional materials, WS2 nanosheets have drawn much attention with different kinds of research methods. Yet ion irradiation method was barely used for WS2 nanosheets. In this paper, the structure, composition and optical band gap (Eg) of the multilayer WS2 films deposited by chemical vapor deposition (CVD) method on sapphire substrates before and after oxygen ion irradiation with different energy and fluences were studied. Precise tailored layer-structures and a controllable optical band gap of WS2 nanosheets were achieved after oxygen ion irradiation. The results shows higher energy oxygen irradiation changed the shape from triangular shaped grains to irregular rectangle shape but did not change 2H-WS2 phase structure. The intensity of () and () modes decreased and have small shifts after oxygen ion irradiation. The peak frequency difference between the () and () modes (Δω) decreased after oxygen ion irradiation, and this result indicates the number of layers decreased after oxygen ion irradiation. The Eg decreased with the increase of the energy and the fluence of oxygen ions. The number of layers, thickness and optical band gap changed after ion irradiation with different ion fluences and energies. The results proposed a new strategy for precise control of multilayer nanosheets and demonstrated the high applicability of ion irradiation in super-capacitors, field effect transistors and other applications.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2018.01.019Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2018.01.019;
- PII
- S0169433218300217;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 439
- Journal Page Range
- p. 240-245
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54056074
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CAPACITORS; CHEMICAL VAPOR DEPOSITION; FIELD EFFECT TRANSISTORS; IRRADIATION; LAYERS; MODIFICATIONS; NANOSTRUCTURES; OXYGEN IONS; SAPPHIRE; SHAPE; SHEETS; SUBSTRATES; THICKNESS; TUNGSTEN SULFIDES
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL COATING; CORUNDUM; DEPOSITION; DIMENSIONS; ELECTRICAL EQUIPMENT; EQUIPMENT; IONS; MINERALS; OXIDE MINERALS; REFRACTORY METAL COMPOUNDS; SEMICONDUCTOR DEVICES; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; TRANSISTORS; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2018 Elsevier B.V. All rights reserved.