Published January 17, 2005 | Version v1
Journal article

Ablation of organic polymers by 46.9-nm-laser radiation

  • 1. NSF ERC for Extreme Ultraviolet Science and Technology and Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, Colorado 80523 (United States)
  • 2. Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, PL-02-668 Warsaw (Poland)
  • 3. Institute of Macromolecular Chemistry, Czech Academy of Sciences, Heyrovskeho nam. 2, 162 06 Prague 6 (Czech Republic)
  • 4. Institute of Physics, Czech Academy of Sciences, Na Slovance 2, 182 21 Prague 8 (Czech Republic)

Description

We report results of the exposure of poly(tetrafluoroethylene) -(PTFE), poly(methyl methacrylate) -(PMMA), and polyimide -(PI) to intense 46.9-nm-laser pulses of 1.2-ns-duration at fluences ranging from ∼0.1 to ∼10 J/cm2. The ablation rates were found to be similar for all three materials, ∼80-90 nm/pulse at 1 J/cm2. The results suggest that the ablation of organic polymers induced by intense extreme ultraviolet laser radiation differs from that corresponding to irradiation with longer wavelengths

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
86
Journal Issue
3
Journal Page Range
p. 034109-034109.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2005 American Institute of Physics