Published 2011 | Version v1
Miscellaneous Metadata-only

Multi-gated field emitters for a micro-column

Creators

  • 1. Research Inst. of Electronics, Shizuoka Univ., 432-8011, Hamamatsu (Japan)
  • 2. National Inst. of Advanced Industrial Science and Technology, 305-8568, Tsukuba (Japan)

Description

We have developed a multi-gated field emitter (FE) such as a quadruple-gated FE with a three-stacked electrode lens and a quintuple-gated FE with a four-stacked electrode lens. Both the FEs can focus the electron beam. However, the quintuple-gated FE has a stronger electron convergence than the quadruple-gated FE, and a beam crossover is clearly observed for the quintuple-gated FE.

Part of:
ICNBME-2011: International Conference on Nanotechnologies and Biomedical Engineering; German-Moldovan Workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications. Proceedings

Additional details

Publishing Information

Publisher
Technical University of Moldova
Imprint Place
Chisinau (Moldova, Republic of)
ISBN
978-9975-66-239-0
Imprint Title
ICNBME-2011: International Conference on Nanotechnologies and Biomedical Engineering; German-Moldovan Workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications. Proceedings
Imprint Pagination
460 p.
Journal Page Range
p. 145-147
Report number
INIS-MD--008

Conference

Title
International Conference on Nanotechnologies and Biomedical Engineering; German-Moldovan Workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications. Proceedings
Acronym
ICNBME-2011
Dates
7-8 Jul 2011
Place
Chisinau (Moldova, Republic of)

INIS

Country of Publication
Moldova, Republic of
Country of Input or Organization
Moldova, Republic of
INIS RN
42086314
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference, Non-conventional Literature
Descriptors DEI
BEAMS; CHEMICAL VAPOR DEPOSITION; ELECTRODES; ELECTRON BEAMS; ELECTRON EMISSION; EMISSION; ETCHING; FILMS; FOCUSING; NIOBIUM; SCANNING ELECTRON MICROSCOPY; SILICON
Descriptors DEC
BEAMS; CHEMICAL COATING; DEPOSITION; ELECTRON MICROSCOPY; ELEMENTS; EMISSION; LEPTON BEAMS; METALS; MICROSCOPY; PARTICLE BEAMS; REFRACTORY METALS; SEMIMETALS; SURFACE COATING; SURFACE FINISHING; TRANSITION ELEMENTS

Optional Information

Notes
3 refs., 5 figs.