Smart pile-up consideration for evaluation of high count rate EDS spectra
Creators
- 1. Edax Inc., Ametek Materials Analysis Division, 91 McKee Drive, US-07430 Mahwah, New Jersey (United States)
- 2. now at: University of Washington, Applied Physics Laboratory, Seattle, US-98105-6698 Washington (United States)
Description
This work describes a new pile-up consideration for the very high count rate spectra which are possible to acquire with silicon drift detector (SDD) technology. Pile-up effects are the major and still remaining challenge with the use of SDD for EDS in scanning electron microscopes (SEM) with ultra thin windows for soft X-ray detection. The ability to increase the count rates up to a factor of 100 compared with conventional Si(Li) detectors, comes with the problem that the pile-up recognition (pile-up rejection) in pulse processors is not able to improve by the same order of magnitude, just only with a factor of about 3. Therefore, it is common that spectra will show significant pile-up effects if count rates of more than 10000 counts per second (10 kcps) are used. These false counts affect both automatic qualitative analysis and quantitative evaluation of the spectra. The new idea is to use additional inputs for pile-up calculation to shift the applicability towards very high count rates of up to 200 kcps and more, which can be easily acquired with the SDD. The additional input is the 'known' (estimated) background distribution, calculated iteratively during all automated qualitative or quantitative evaluations. This additional knowledge gives the opportunity for self adjustment of the pile-up calculation parameters and avoids over-corrections which challenge the evaluation as well as the pile-up artefacts themselves. With the proposed method the pile-up correction is no longer a 'correction' but an integral part of all spectra evaluation steps. Examples for the application are given with evaluation of very high count rate spectra.
Availability note (English)
Available from http://dx.doi.org/10.1088/1757-899X/32/1/012008Additional details
Identifiers
Publishing Information
- Journal Title
- IOP Conference Series. Materials Science and Engineering (Online)
- Journal Volume
- 32
- Journal Issue
- 1
- Journal Page Range
- [10 p.]
- ISSN
- 1757-899X
Conference
- Title
- 12. European workshop on modern developments in microbeam analysis
- Acronym
- EMAS 2011
- Dates
- 15-19 May 2011
- Place
- Angers (France)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43100806
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COUNTING RATES; LI-DRIFTED SI DETECTORS; SCANNING ELECTRON MICROSCOPY; SILICON; SOFT X RADIATION; SPECTRA; X-RAY DETECTION
- Descriptors DEC
- DETECTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; IONIZING RADIATIONS; LI-DRIFTED DETECTORS; MEASURING INSTRUMENTS; MICROSCOPY; RADIATION DETECTION; RADIATION DETECTORS; RADIATIONS; SEMICONDUCTOR DETECTORS; SEMIMETALS; SI SEMICONDUCTOR DETECTORS; X RADIATION