Study of (3-mercaptopropyl)trimethoxysilane reactivity on zinc: Comparison with organothiol and organosilane thin films
- 1. Fonds pour la Formation a la Recherche dans l'Industrie et dans l'Agriculture, Rue d'Egmont 5, B-1000 Bruxelles (Belgium)
- 2. Laboratoire de Chimie et d'Electrochimie des Surfaces, Facultes Universitaires Notre-Dame de la Paix, Rue de Bruxelles 61, B-5000 Namur (Belgium)
Description
To assess the reactivity of both terminal functions of the (3-mercaptopropyl)trimethoxysilane molecule, three types of zinc substrate (mechanically polished, electrochemically reduced and electrochemically oxidized) were modified concurrently by 1H,1H,2H,2H-perfluorooctyl-triethoxysilane and 1H,1H,2H,2H-perfluorooctanethiol. Surface characterization has been carried out with X-ray photoelectron spectroscopy, polarization modulation infrared reflection-absorption spectroscopy and contact angle measurements. Classical electrochemical techniques were employed to investigate corrosion inhibition of zinc along with thin films grafting. It is found that electrochemical oxidation enhances the grafting of the -Si(OCH3)3 groups while electrochemical reduction facilitates the formation of thiolate bonds, leading both to modified surfaces of much better quality compared to modified polished zinc samples
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2007.01.049;
- PII
- S0040-6090(07)00114-9;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 17
- Journal Page Range
- p. 6833-6843
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39018991
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; CORROSION; CORROSION PROTECTION; ELECTROCHEMISTRY; INTERFACES; OXIDATION; POLARIZATION; REACTIVITY; REDUCTION; SILANES; SURFACES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY; ZINC
- Descriptors DEC
- CHEMICAL REACTIONS; CHEMISTRY; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; HYDRIDES; HYDROGEN COMPOUNDS; METALS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; SILICON COMPOUNDS; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.