Published October 6, 1982 | Version v1
Patent Open

Thinning of specimens for examination under the electron microscope

Description

Heretofore specimens have been thinned to penetration for examination by electron microscopy techniques, by ion erosion techniques. A more rapid technique is disclosed employing a beam or beams comprised solely of neutral particles. In tests carried out using this technique the sputtering rate from a sample specimen has been shown to be several percentages greater using a neutral source than from an ion source with the same flux density. (author)

Availability note (English)

MF available from INIS under the Report Number.

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Additional details

Publishing Information

Imprint Pagination
3 p.
IPC:
Int. Cl. G01n1/28.
IPC
Int. Cl. G01n1/28.
Patent number
GB patent document 2095857/A/

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
14759483
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BEAM NEUTRALIZATION; BEAMS; ELECTRON MICROSCOPY; EROSION; NEUTRAL PARTICLES; SAMPLE PREPARATION; SPUTTERING; THICKNESS
Descriptors DEC
DIMENSIONS; MICROSCOPY