Published April 2009 | Version v1
Journal article

Optical and structural characteristics of Ga-doped ZnO films

  • 1. Russian Academy of Sciences, Institute on Laser and Information Technologies (Russian Federation)
  • 2. University of Technology, Institute of Semiconductor and Microsystem Technology (Germany)
  • 3. Moscow State Institute of Steel and Alloys (Technological University) (Russian Federation)

Description

The n-ZnO films doped with Ga to the content 2.5 at % are produced by pulse laser deposition onto the (0001) oriented single crystal sapphire substrates. The transmittance spectra of the ZnO films in the range from 200 to 3200 nm are studied in relation to the Ga dopant content. It is established that an increase in the Ga content shifts the fundamental absorption edge to the blue region, but reduces the transparency of the ZnO films in the infrared spectral region. The dependence of the band gap on the level of doping with Ga is determined. The photoluminescence spectra of the ZnO films doped to different levels are recorded. It is established that the PL intensity and peak position vary unsteadily with the level of doping. X-ray diffraction studies of the structure of the films are carried out. It is found that the crystallographic parameters (the lattice constant c) of the ZnO film depend on the Ga dopant content and the conditions of deposition of the films.

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
43
Journal Issue
4
Journal Page Range
p. 419-424
ISSN
1063-7826
CODEN
SMICES

Optional Information

Copyright
Copyright (c) 2009 Pleiades Publishing, Ltd.