Physical foundations of ion technologies for stable multilayer metallic materials formation

The problem of chemical compatibility of heat-resistant subsurface layers with high-temperature substrates is solved in terms of a thermodynamic approach and ion-beam (ion-plasma) methods of material treatment. The main stages of the proposed technology for production of stable multilayer materials are given. The obtained high-temperature stability of the chromium enriched coating prepared by ion implantation, ion-plasma deposition the thermal vacuum evaporation is an evidence of scientific substantiation of the proposed approach. The modern methods of synchrotron radiation glancing angle and nuclear resonance reactions are applied for investigation of diffusion processes of stability and phase-structural state of subsurface layers. In frames of the electron density model functional method, the model of many-body inter-atomic interaction potential calculation for binary alloys is proposed. It is possible investigate the properties of alloy with any composition and with complicated crystal structure using the proposed scheme. A theoretical analysis of alloy formation peculiarity in the Ni-Al and Cu-Au systems both at normal conditions and under pressure is carried out. The physical bases of ion technologies for obtaining of thermally equilibrium metallic materials with depth varying chemical content and phase-structural states are proposed. The book in intended for scientists dealing with solid state radiation physics, ion implantation, material science (author)