Synthesis, structural and field emission properties of multiwall carbon nanotube-graphene-like nanocarbon hybrid films grown by microwave plasma enhanced chemical vapor deposition
Creators
- 1. Polymorphic Carbon Thin Films Group, Physics of Energy Harvesting Division, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Marg, New Delhi 110012 (India)
- 2. Physics and Engineering of Carbon, Materials Physics and Engineering Division, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Marg, New Delhi 110012 (India)
- 3. Electron and Ion Microscopy, Sophisticated and Analytical Instruments, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Marg, New Delhi 110012 (India)
Description
Multiwall carbon nanotube (MWCNT)-graphene-like nanocarbon hybrid films were directly deposited on nickel substrate without any pre-treatment in a single-step by microwave plasma enhanced chemical vapor deposition (MW PECVD) technique at 600 °C. The effects of hydrogen partial pressure on the growth of MWCNT-graphene-like nanocarbon hybrid films and their structural, morphological and field emission properties were investigated. High resolution scanning electron microscope revealed MWCNT structure. High resolution transmission electron microscope images and Raman spectra revealed graphene-like nanocarbon film. Raman spectra showed 2D, G, D and D + G peaks at approximately 2690, 1590, 1350 and 2930 cm−1, respectively. The minimum threshold field for electron emission was found to be 3.6 V/μm corresponding to 1 μA/cm2 current density for the MWCNT-graphene-like nanocarbon hybrid film deposited at 20 Torr pressure whereas the maximum current density of 0.12 mA/cm2 and field enhancement factor of ∼3356 was obtained for the sample deposited at 5 Torr pressure. - Highlights: • MWCNT-graphene-like nanocarbon hybrid films were synthesized by MWPECVD technique. • Effect of pressure on the structural and field emission properties has been studied. • FESEM revealed MWCNT and HRTEM revealed graphene-like nanocarbon film structure. • Minimum ET = 3.6 V/μm with β = 3164 has been obtained in the film deposited at 20 Torr. • Maximum J = 0.12 mA/cm2 with β = 3356 has been obtained in the film deposited at 5 Torr
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matchemphys.2015.02.016Additional details
Identifiers
- DOI
- 10.1016/j.matchemphys.2015.02.016;
- PII
- S0254-0584(15)00111-X;
Publishing Information
- Journal Title
- Materials Chemistry and Physics
- Journal Volume
- 156
- Journal Page Range
- p. 38-46
- ISSN
- 0254-0584
- CODEN
- MCHPDR
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47044367
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRON EMISSION; FIELD EMISSION; GRAPHENE; MICROWAVE RADIATION; NICKEL; PARTIAL PRESSURE; RAMAN SPECTRA; RAMAN SPECTROSCOPY; RESOLUTION; SCANNING ELECTRON MICROSCOPY; SCATTERING; SUBSTRATES; SYNTHESIS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CARBON; CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELEMENTS; EMISSION; FILMS; LASER SPECTROSCOPY; METALS; MICROSCOPY; NANOSTRUCTURES; NANOTUBES; NONMETALS; PHYSICAL PROPERTIES; RADIATIONS; SPECTRA; SPECTROSCOPY; SURFACE COATING; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.