Published January 15, 2014 | Version v1
Journal article

Mechanistic study of Al electrodeposition from EMIC–AlCl3 and BMIC–AlCl3 electrolytes at low temperature

  • 1. Research and Development Department, Tata Steel Ltd, Jamshedpur 831001 (India)
  • 2. Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487 (United States)

Description

Aluminum was electrodeposited from two different ionic liquid electrolytes namely; 1-ethyl-3-methylimidazolicum chloride and AlCl3 (EMIC–AlCl3) and 1-butyl-3-methylimidazolium chloride (BMIC–AlCl3) at 90 ± 2 °C. Nodular morphology of aluminum was obtained at the copper substrate. To evaluate the reaction mechanism, chronoamperometric study was adopted. From the chronoamperometric analysis, it was observed that the reaction was controlled by instantaneous three-dimensional diffusion process. The diffusion coefficient (D) of Al2C7− was found to be 5.2–6.6 × 10−11 m2 s−1 and 2.2 × 10−11 m2 s−1 for EMIC–AlCl3 and BMIC–AlCl3 ionic liquid electrolytes, respectively. The nuclei density of electrodeposited aluminum on the copper was also confirmed by scanning electron microscope wherein uniformly distributed aluminum nodules were observed. - Highlights: • Al electrodeposit was obtained using EMIC–AlCl3 and BMIC–AlCl3 ionic liquids. • Deposition process was governed by instantaneous 3-dimensional nucleation. • Diffusion coefficient was found in the order of 10−11 m2 s−1 for both electrolytes. • Number of nuclei sites of aluminum was estimated in the order of 1012 N m−2

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2013.09.033

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2013.09.033;
PII
S0254-0584(13)00713-X;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
143
Journal Issue
2
Journal Page Range
p. 564-569
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.