Published October 25, 2006
| Version v1
Journal article
A flow model of porous anodic film growth on aluminium
- 1. Corrosion and Protection Centre, School of Materials, University of Manchester, P.O. Box 88, Manchester M60 1QD (United Kingdom)
- 2. Graduate Engineering School, Hokkaido University, N13 W8, Kita-ku, Sapporo 060-8628 (Japan)
Description
The development of pores in a classical porous anodic film formed on aluminium in phosphoric acid solution is investigated. The study employs a tungsten tracer layer that is incorporated into the anodic film from the aluminium substrate, followed by detection of the tracer by transmission electron microscopy and Rutherford backscattering spectroscopy. Distortions of the tungsten layer on entry into the film and retention of tungsten species in the film are compatible with porosity arising mainly from flow of anodic oxide beneath the pore bases towards the cell walls. The behaviour is contrary to expectations of a dissolution model of pore formation
Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2006.05.054;
- PII
- S0013-4686(06)00651-7;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 52
- Journal Issue
- 2
- Journal Page Range
- p. 681-687
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38025441
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ALUMINIUM; FILMS; FLOW MODELS; OXIDES; PHOSPHORIC ACID; POROUS MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN
- Descriptors DEC
- CHALCOGENIDES; ELECTRON MICROSCOPY; ELEMENTS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; MATERIALS; MATHEMATICAL MODELS; METALS; MICROSCOPY; OXYGEN COMPOUNDS; PHOSPHORUS COMPOUNDS; REFRACTORY METALS; SPECTROSCOPY; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.