Published 1995
| Version v1
Book
X-ray flash microprobing of structural dynamics in exploding crystals
- 1. Univ. of Central Florida, Orlando, FL (United States). Center for Research and Education in Optics and Lasers
Description
The authors describe a new technique for investigating transient structural changes in solid materials involving short pulses of hard x-rays emitted by laser produced plasmas. Using a subpicosecond terawatt scale laser system, this technique promises to be simple and broadly applicable to both single-crystal and polycrystalline samples of thickness up to millimeters and mean atomic number up to approximately 30. Spatial resolutions of order 10 microm should be possible. Of particular interest are the so-called energetic materials, chemical high explosives, whose initiation and reaction dynamics in relation to physical microstructure are poorly known
Additional details
Publishing Information
- Publisher
- SPIE-The International Society for Optical Engineering.
- Imprint Place
- Bellingham, WA (United States)
- ISBN
- 0-8194-1882-X
- Imprint Title
- Applications of laser plasma radiation 2
- Imprint Pagination
- 333 p.
- Series
- Proceedings/SPIE, Volume 2523.
- Journal Page Range
- p. 299-305.
Conference
- Title
- SPIE applications of laser plasma radiation II.
- Dates
- 12-14 Jul 1995.
- Place
- San Diego, CA (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 28006877
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL EXPLOSIVES; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; HARD X RADIATION; LASER-PRODUCED PLASMA; LAUE METHOD; MONOCRYSTALS; MORPHOLOGICAL CHANGES; POLYCRYSTALS; SHOCK WAVES; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; CRYSTALS; DIFFRACTION; DIFFRACTION METHODS; ELECTROMAGNETIC RADIATION; EXPLOSIVES; IONIZING RADIATIONS; PLASMA; RADIATIONS; SCATTERING; X RADIATION
Optional Information
- Secondary number(s)
- CONF-9507222--.