Activation energies of grain growth mechanisms in aluminum coatings
- 1. Lawrence Livermore National Laboratory, Chemistry and Materials Science, CA (United States)
- 2. Lawrence Livermore National Laboratory, Mechanical Engineering, Livermore, CA 94551-9900 (United States)
Description
To produce a specific grain size in metallic coatings requires precise control of the time at temperature during the deposition process. Aluminum coatings are deposited using electron-beam evaporation onto heated substrate surfaces of both mica and lithium flouride. The grain size of the coating is determined upon examination of the microstructure in plan view and cross-section. Ideal grain growth is observed over the entire experimental range of temperature examined from 413 to 843 K. A transition in the activation energy for grain growth from 0.87 to 2.04 eV atom-1 is observed as the temperature increases from < 526 K to > 588 K. The transition is indicative of the dominant mechanism for grain growth shifting with increasing temperature from grain boundary to lattice diffusion
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2005.05.027;
- PII
- S0040-6090(05)00548-1;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 491
- Journal Issue
- 1-2
- Journal Page Range
- p. 61-65
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37023082
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ACTIVATION ENERGY; ALUMINIUM; COATINGS; DEPOSITION; DIFFUSION; ELECTRON BEAMS; EV RANGE 01-10; EVAPORATION; GRAIN BOUNDARIES; GRAIN GROWTH; GRAIN SIZE; LITHIUM FLUORIDES; MICA; SURFACES
- Descriptors DEC
- ALKALI METAL COMPOUNDS; BEAMS; ELEMENTS; ENERGY; ENERGY RANGE; EV RANGE; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; LEPTON BEAMS; LITHIUM COMPOUNDS; LITHIUM HALIDES; METALS; MICROSTRUCTURE; MINERALS; PARTICLE BEAMS; PHASE TRANSFORMATIONS; SILICATE MINERALS; SIZE
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.