Published September 15, 2015 | Version v1
Journal article

Controlled fabrication and enhanced photocatalystic performance of BiVO4@CeO2 hollow microspheres for the visible-light-driven degradation of rhodamine B

  • 1. School of Science, Minzu University of China, Beijing 100081 (China)
  • 2. Faculty of Sciences, Ningbo University, Zhejiang, Ningbo 315211 (China)

Description

Graphical abstract: - Highlights: • m-BiVO4@CeO2 hollow microspheres were firstly fabricated. • m-BiVO4@CeO2 was used for photocatalytic degradation of rhodamine B. • The photocatalytic activity of heterogeneous hollow microspheres is enhanced. • Photocatalytic mechanism on m-BiVO4@CeO2 by visible light irradiation was proposed. • Efficient separation of photoexcited charges results in enhanced catalytic activity. - Abstract: m-BiVO4@CeO2 hollow microspheres have been fabricated by a facile low-temperature co-precipitation method and subsequent annealing process. The composition, morphology and size of the as-fabricated m-BiVO4@CeO2 hollow microspheres were characterized by X-ray powder diffraction (XRD) and scanning electron microscopy (SEM). The vibrational features and the electronic state of the as-obtained m-BiVO4@CeO2 hollow microspheres were studied by Raman spectra and X-ray photoelectron spectroscopy (XPS). Band-gap energy of the as-prepared m-BiVO4@CeO2 hollow microspheres was evaluated by UV–vis spectrum. The visible-light-driven photocatalystic performances were evaluated by degradation for RhB dye molecules, demonstrating that the as-fabricated m-BiVO4@CeO2 hollow microspheres exhibit the enhanced photocatalystic activity, compared to the obtained pure m-BiVO4 microspheres. The separation of photoinduced electron–hole pairs and transfer between CeO2 and BiVO4 has been discussed in detail, in order to have in-depth understanding on the enhanced photocatalytic performance. The results indicate that the enhanced photocatalystic activity of the as-fabricated m-BiVO4@CeO2 hollow microspheres is attributed to the efficient separation of the photoexcited electrons and holes

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2015.04.195

Additional details

Identifiers

DOI
10.1016/j.apsusc.2015.04.195;
PII
S0169-4332(15)01061-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
349
Journal Page Range
p. 529-537
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.