Study on a conductive channel of a Pt/NiO/Pt ReRAM by bias application with/without a magnetic field
Creators
- 1. Waseda University, Faculty of Science and Engineering, School of Advanced Science and Engineering, Tokyo (Japan)
Description
Resistive random access memories (ReRAMs) have attracted much attention as a next-generation non-volatile memory. We focused on a NiO-based ReRAM in this study because it contains the magnetic element Ni. As-fabricated devices exhibit ideal memristive operation. When bias was swept in one polarity, the resistance decreased by repeating the bias sweeping. Conversely, by changing the polarity of the sweeping bias, the resistance gradually increased by repeating the bias sweeping. A steep increase in current was observed when continuing bias sweeping in the polarity that decreased the resistance. The resistance after that was lower than 12.9 kΩ, which suggests the formation of a Ni atom chain. Conductance quantization, with a unit of 2e2/h, also suggested the said formation. When a magnetic field was applied, the unit of conductance quantization appeared to change from 2e2/h to e2/h. (author)
Availability note (English)
Available from DOI: https://doi.org/10.35848/1347-4065/abe7c1Additional details
Identifiers
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics (Online)
- Journal Volume
- 60
- Journal Issue
- SC
- Journal Page Range
- p. SCCF03.1-SCCF03.5
- ISSN
- 1347-4065
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 53074110
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRIC CONDUCTIVITY; ELECTRICAL INSULATORS; ELECTRODES; ELECTRON BEAMS; FERROELECTRIC MATERIALS; FLUX DENSITY; MAGNETIC FIELDS; MAGNETIC FLUX; MAGNETISM; MEMORY DEVICES; NICKEL OXIDES; QUANTIZATION; REDOX REACTIONS; SCANNING TUNNELING MICROSCOPY; SPIN
- Descriptors DEC
- ANGULAR MOMENTUM; BEAMS; CHALCOGENIDES; CHEMICAL REACTIONS; DIELECTRIC MATERIALS; ELECTRICAL EQUIPMENT; ELECTRICAL PROPERTIES; EQUIPMENT; LEPTON BEAMS; MATERIALS; MICROSCOPY; NICKEL COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PARTICLE PROPERTIES; PHYSICAL PROPERTIES; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- 34 refs., 6 figs.