Published August 10, 1994 | Version v1
Journal article

Thermoelectric properties and structure of MexSi1-x(Me=Ir,Fe,Re) thin films

  • 1. Institute of Solid State and Materials Sciences e.V., D-01171 Dresden (Germany)
  • 2. Physico-Technical Ioffe Institute, 194021 St. Petersburg (Russian Federation)

Description

The thermopower and resistivity of MexSi1-x(Me=Fe, Ir and Re) thin films have been investigated with compositions in the vicinity and outside of the stoichiometry of the corresponding semiconducting silicides. In situ measurements up to 1100 K give insight into crystallization processes during annealing of the as-deposited amorphous films. Outside the stoichiometric compositions systematic changes of the thermopower on composition have been found, which are discussed on the basis of results from phase analysis. The behavior of the Re-Si films is different in comparison with the other two systems because of the high degeneracy of the corresponding silicide ReSi2. copyright 1995 American Institute of Physics

Additional details

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
316
Journal Issue
1
Journal Page Range
p. 45-49.
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
13. international conference on thermoelectrics.
Dates
30 Aug - 1 Sep 1994.
Place
Kansas City, MO (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
27024870
Subject category
S30: DIRECT ENERGY CONVERSION;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; IRIDIUM SILICIDES; IRON SILICIDES; RHENIUM SILICIDES; SEEBECK EFFECT; TEMPERATURE DEPENDENCE; THERMOELECTRIC PROPERTIES; THIN FILMS
Descriptors DEC
ELECTRICAL PROPERTIES; FILMS; IRIDIUM COMPOUNDS; IRON COMPOUNDS; PHYSICAL PROPERTIES; RHENIUM COMPOUNDS; SILICIDES; SILICON COMPOUNDS; TRANSITION ELEMENT COMPOUNDS

Optional Information

Secondary number(s)
CONF-940830--.