Published November 3, 2008
| Version v1
Journal article
Anisotropy of the surface thermodynamic properties of silicon
Creators
- 1. Interdisciplinaire de Nanoscience de Marseille, UPR CNRS 3118, Aix-Marseille Universite, Campus de Luminy, case 913, F-13288 Marseille Cedex 9 (France)
Description
Three main macroscopic quantities are necessary to describe the thermodynamic properties of a crystalline surface: its surface free energy, its surface stress and its surface stiffness. Obviously, for a crystal, these quantities depend upon the crystallographic direction. We report experimental measurements of the crystalline anisotropy of all these quantities for silicon crystal. Surface free energy and surface stiffness anisotropies are deduced from a careful study of the silicon equilibrium shape, whereas the surface-stress anisotropy is deduced from artificial destabilization of crystalline Si surfaces by means of electromigration
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2008.08.143Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2008.08.143;
- PII
- S0040-6090(08)00953-X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 517
- Journal Issue
- 1
- Journal Page Range
- p. 65-68
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 5. International conference on silicon epitaxy and heterostructures
- Acronym
- ICSI-5
- Dates
- 20-24 May 2007
- Place
- Marseille (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40058973
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANISOTROPY; CRYSTALLOGRAPHY; CRYSTALS; ELASTICITY; ELECTROPHORESIS; EQUILIBRIUM; FLEXIBILITY; SILICON; STRESSES; SURFACE ENERGY; SURFACES
- Descriptors DEC
- ELEMENTS; ENERGY; FREE ENERGY; MECHANICAL PROPERTIES; PHYSICAL PROPERTIES; SEMIMETALS; SURFACE PROPERTIES; TENSILE PROPERTIES; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.