Published November 1988 | Version v1
Journal article Metadata-only

Mass analysis for metal and plastics by a FAB SIMS/SNMS apparatus

Creators

  • 1. Nippon Telegraph and Telephone Corp., Musashino, Tokyo (Japan). Applied Electronics Labs.

Description

A FAB SIMS/SNMS, which is a mass analyzer for secondary ions and sputtered neutrals emitted from a solid bombarded by a fast atom beam, has been developed for analysis of metal or plastics. The fast atom beam for bombardment are an oxygen atom beam with a kinetic energy of 3 keV and a flow of 1 x 1014 atoms/sec (equivalent to 10μA of ion current). The sputtered neutral spectra are separated from the residual gas spectra on a computer. This separation technique avoids the loss of analytical sensitivity. The apparatus is suitable for analysis of a thermolabile insulator such as polyethylene film. (author)

Additional details

Publishing Information

Journal Title
Denki Tsushin Kenkyusho Kenkyu Jitsuyoka Hokoku
Journal Volume
37
Journal Issue
11
Series
Denki Tsushin Kenkyusho Kenkyu Jitsuyoka Hokoku.
Journal Page Range
737-745
ISSN
0415-3200
CODEN
DTKKA

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
20032378
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
ATOMIC BEAMS; ATOMS; CHEMICAL COMPOSITION; MASS SPECTROMETERS; MASS SPECTROSCOPY; METALS; POLYETHYLENES; SECONDARY EMISSION; SENSITIVITY; SPUTTERING
Descriptors DEC
BEAMS; ELEMENTS; EMISSION; MEASURING INSTRUMENTS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; POLYMERS; POLYOLEFINS; SPECTROMETERS; SPECTROSCOPY