Published March 31, 1975 | Version v1
Patent

Liquid level control system of fast reactor secondary cooling system

Description

Object: To minimize the range of the liquid level variation of the cooling system and reduce the time required for the liquid level control by sealing the gas of a cover gas respiration system which acts upon an evaporator and pump overflow column. Structure: In liquid level control by the cover gas pressure of a high-speed reactor secondary cooling system, upon occurrence of a sudden change in the rate of flow of the recirculated liquid, automatic check valves provided in an evaporator and pump overflow column cover gas respiration system are completely or substantially closed, while at the same time the recirculation cooling medium is sucked up and an automatic check valve provided in the overflow system is closed. (Kamimura, M.)

Availability note (English)

Available from The Japan Patent Information Center, Tokyo; hard paper copy 40 Yen/page (mailing charge additional).

Additional details

Publishing Information

Imprint Pagination
8 p.
IPC:
Int. Cl. G21C17/00; G05B9/00.
IPC
Int. Cl. G21C17/00; G05B9/00.
Patent number
JP patent document 1976-113094/A/