Micro-networked metal coating using self-cracked WO3 inorganic thin film as sacrificial layer: Application to transparent flexible electrodes
Creators
- 1. Department of Materials Science and Engineering, Ajou University, Suwon 16499 (Korea, Republic of)
- 2. Department of Energy Systems Research, Ajou University, Suwon 16499 (Korea, Republic of)
- 3. School of Civil, Environmental, and Architectural Engineering, Korea University, Seoul 02841, South (Korea, Republic of)
- 4. Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673 (Korea, Republic of)
Description
Highlights: • Micro-networked metal electrode using a self-cracked WO3 film as a sacrificial layer. • Electrical conductivity of approximately ∼100 Ω/sq was measured. • An average transmittance was 95.6% in the visible light region. • The electrical resistance was maintained stable with repeated bending tests (>10000). A method of fabricating a micro-networked metal electrode using a self-cracking WO3 oxide thin film as a sacrificial layer is presented. The width of the formed crack can be adjusted to a size of 10 to 40 µm by adjusting the wet-etching time in dilute NaOH solution, and accordingly, the electrical conductivity and transmittance of the electrode can be adjusted. An electrical conductivity of approximately 100 Ω/sq was measured at an average transmittance of 95.6% in the visible light region, and when applied to a flexible substrate, the electrical resistance was maintained stable even with repeated bending tests. The method proposed in this study can be applied to various transparent flexible electrode devices.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2021.138916Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2021.138916;
- PII
- S0040609021003990;
Publishing Information
- Journal Title
- Thin Solid Films (Print)
- Journal Volume
- 736
- Journal Page Range
- vp.
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54005226
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COATINGS; CRACKING; CRACKS; ELECTRIC CONDUCTIVITY; ETCHING; LAYERS; METALS; SODIUM HYDROXIDES; SUBSTRATES; THIN FILMS; TUNGSTATES; TUNGSTEN OXIDES
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CHALCOGENIDES; CHEMICAL REACTIONS; DECOMPOSITION; ELECTRICAL PROPERTIES; ELEMENTS; FILMS; HYDROGEN COMPOUNDS; HYDROXIDES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PYROLYSIS; REFRACTORY METAL COMPOUNDS; SODIUM COMPOUNDS; SURFACE FINISHING; THERMOCHEMICAL PROCESSES; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2021 Elsevier B.V. All rights reserved.