Published October 30, 2009
| Version v1
Journal article
Electrochemical degradation of waters containing O-Toluidine on PbO2 and BDD anodes
- 1. UR Electrochimie et Environnement, Ecole Nationale d'Ingenieurs de Sfax, BPW 3038 Sfax (Tunisia)
Description
Electrochemical oxidation of O-Toluidine (OT) was studied by galvanostatic electrolysis using lead dioxide (PbO2) and boron-doped diamond (BDD) as anodes. The influence of operating parameters, such as current density, initial concentration of OT and temperature was investigated. Measurements of chemical oxygen demand were used to follow the oxidation. The experimental data indicated that on PbO2 and BDD anodes, OT oxidation takes place by reaction with electrogenerated hydroxyl radicals and is favoured by low current density and high temperature. Furthermore, BDD anodes offer significant advantages over PbO2 in terms of current efficiency and oxidation rate.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jhazmat.2009.05.058Additional details
Identifiers
- DOI
- 10.1016/j.jhazmat.2009.05.058;
- PII
- S0304-3894(09)00794-8;
Publishing Information
- Journal Title
- Journal of Hazardous Materials
- Journal Volume
- 170
- Journal Issue
- 2-3
- Journal Page Range
- p. 928-933
- ISSN
- 0304-3894
- CODEN
- JHMAD9
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43125475
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANODES; CHEMICAL OXYGEN DEMAND; CURRENT DENSITY; DIAMONDS; DOPED MATERIALS; EFFICIENCY; ELECTROCHEMISTRY; HYDROXYL RADICALS; LEAD OXIDES; OXIDATION; TEMPERATURE RANGE 0400-1000 K; WASTE WATER
- Descriptors DEC
- CARBON; CHALCOGENIDES; CHEMICAL REACTIONS; CHEMISTRY; ELECTRODES; ELEMENTS; HYDROGEN COMPOUNDS; LEAD COMPOUNDS; LIQUID WASTES; MATERIALS; MINERALS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; RADICALS; TEMPERATURE RANGE; WASTES; WATER
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.