Published November 30, 2013 | Version v1
Journal article

Template-free synthesis of vertically oriented tellurium nanowires via a galvanic displacement reaction

  • 1. Department of Bionano technology/Fine Chemical Engineering, Hanyang University, Ansan 426-791 (Korea, Republic of)
  • 2. Electrochemistry Department, Korea Institute of Materials Science, Changwon 641-831 (Korea, Republic of)
  • 3. Department of Chemical and Environmental Engineering, University of California-Riverside, Riverside, CA 92521 (United States)

Description

The scalable, high-throughput, cost-effective synthesis of high-quality tetragonal tellurium (t-Te) nanowires by the galvanic displacement reaction of Si on a 4-in. Si wafer is demonstrated. This method does not require any heterogeneous seeds, physical templates, or surfactants. In addition, because seed nucleation and growth are both instantaneous, the synthesized nanowires had uniform lengths across the substrate. Furthermore, the effects of the deposition conditions, including the solution composition and reaction time and temperature, on the morphologies, dimensions, and crystallinities of the Te nanowires were analyzed to investigate the growth mechanism. The synthesized t-Te nanowires exhibited excellent piezoelectric properties, with the output current being as high as −75.0 nA

Availability note (English)

Available from http://dx.doi.org/10.1016/j.electacta.2013.07.228

Additional details

Identifiers

DOI
10.1016/j.electacta.2013.07.228;
PII
S0013-4686(13)01526-0;

Publishing Information

Journal Title
Electrochimica Acta
Journal Volume
111
Journal Page Range
p. 200-205
ISSN
0013-4686
CODEN
ELCAAV

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45055290
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
DEPOSITION; PIEZOELECTRICITY; QUANTUM WIRES; SUBSTRATES; SYNTHESIS; TELLURIUM
Descriptors DEC
ELECTRICITY; ELEMENTS; NANOSTRUCTURES; SEMIMETALS

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.