Beyond sunshine: Hard x-rays for precision microfabrication

For several years we have explored the use of hard x-rays for a broad range of lithographic applications. The high energy available from the NSLS x-ray ring (E>15 keV) allows the exposure of resist up to several cm thick, while maintaining micron level precision. The high flux and close proximity to the source at this machine make it possible to achieve workable exposures on realistic time scales, enabling production work. In addition to the conventional two-dimensional exposure schemes, we have demonstrated methods for achieving fully figured three dimensional objects with internal re-entrant geometry. Users from outside BNL have been sufficiently successful with their work at our prototype beamline (X-27B) that we have initiated the construction of a dedicated exposure station (X-14B) for High Aspect Ratio Precision Manufacture. An overview of our previous work as well as the current status of the new beamline will be described. copyright 1997 American Institute of Physics