Published 1987 | Version v1
Book

Chemical vapor deposited boron carbide

  • 1. Dept. of Geology, Univ. of New Mexico, Albuquerque, NM (USA)

Description

Detailed analytical electron microscope (AEM) studies of yellow whiskers produced by chemical vapor deposition (CVD) show that two basic types of whiskers are produced at low temperatures (between 12000C and 14000C) and low boron to carbon gas ratios. Both whisker types show planar microstructures such as twin planes and stacking faults oriented parallel to, or at a rhombohedral angle to, the growth direction. For both whisker types, the presence of droplet-like terminations containing both Si and Ni indicate that the growth process during CVD is via a vapor-liquid-solid (VLS) mechanisms

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
0-931837-64-2
Imprint Title
Novel refractory semiconductors
Journal Page Range
vp.

Conference

Title
Materials Research Society symposium on novel refractory semiconductors.
Dates
21-23 Apr 1987.
Place
Anaheim, CA (USA).