Published 1988 | Version v1
Book

Ge related defect-complex induced luminescence in InGaAsP

  • 1. Tata Institute of Fundamental Research, Homi Bhabha Road, Bombay 400005 (India)

Description

Germanium doping of InGaAsP epitaxial layers grown by liquid phase epitaxy produces n type conduction with a net distribution coefficient K/sub Ge/sup --// 5x10/sup -3/. In addition, Ge doping introduces a broad band (--0.2eV) of efficient luminescence which is red shifted with respect to the band edge. The intensity of this band grows with increasing Ge concentration. In all the samples, the integrated intensity of the broad band varies relatively less in the temperature range 15K to about 90K. At higher temperatures, the intensity falls exponentially with an activation energy of 0.05 - 0.07 eV. The emission spectra are compared with the configuration-coordinate model of the emission from a Ge related complex

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
0-931837-72-3
Imprint Title
Defects in electronic materials
Journal Page Range
p. 505-508.

Conference

Title
Symposium on defects in electronic materials.
Dates
30 Nov - 1 Dec 1987.
Place
Boston, MA (USA).