Published December 5, 2006 | Version v1
Journal article

Small angle X-ray scattering measurements of porous low-k films using synchrotron radiation

  • 1. Fujitsu Laboratories Ltd., Akiruno Technology Center 50 Fuchigami, Akiruno, Tokyo 197-0833 (Japan)
  • 2. X-Ray Research Laboratory, Rigaku Corporation, 3-9-12, Matsubara-cho, Akishima, Tokyo 196-8666 (Japan)
  • 3. Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198 (Japan)
  • 4. Fujitsu Ltd., Akiruno Technology Center 50 Fuchigami, Akiruno, Tokyo 197-0833 (Japan)

Description

Synchrotron radiation has been employed to analyze the difference in three representative kinds of spin on glass (SOG) films systematically based on a small angle X-ray scattering (SAXS) technique. The amount of scattering by pores in a SOG film of organic non-template type was found to be extremely smaller than that in low-k films of a template type. The pore size in the organic non-template type SOG film was estimated to be smaller than that of the template type low-k films. A position annihilation lifetime spectroscopy was also applied to confirm the SAXS results. It was found that the consideration of properties of specific low-k films and a scanning strategy in SAXS measurements were important for evaluating the pores of low-k films

Additional details

Identifiers

DOI
10.1016/j.tsf.2006.05.012;
PII
S0040-6090(06)00650-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
4
Journal Page Range
p. 2410-2414
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.