Published October 2010 | Version v1
Journal article

Development of millimeter-wave planar antennas using low-loss materials

  • 1. Kyushu Univ., Art, Science and Technology Center for Cooperative Research, Kasuga, Fukuoka (Japan)
  • 2. Fukuoka Inst. of Technology, Faculty of Engineering, Fukuoka (Japan)
  • 3. Japan Atomic Energy Agency, Quantum Beam Science Directorate, Takasaki, Gunma (Japan)
  • 4. Kyushu Hitachi Maxell, Ltd., Fukuchi, Fukuoka (Japan)

Description

As the importance of advanced millimeter-wave diagnostics increases, the fabrication of high-performance devices and components becomes essential. In this paper, we describe the development of millimeter-wave planar antennas using low-loss fluorine substrates. The problems to be solved in this study are the low degree of adhesion between copper foil and the fluorine substrate and the accuracy of device pattern using conventional fabrication techniques. In order to solve these problems, a new surface treatment of fluorine films and a fabrication method using electro-fine-forming (EF2) are proposed. In order to confirm the performance of the treated films, microstrip lines (MSLs) and planar patch antennas with a low sidelobe level in the E-plane are designed and fabricated on conventional fluorine substrates and grafted poly(tetrafluoroethylene) (PTFE) films. (author)

Availability note (English)

Available from http://dx.doi.org/10.1143/JJAP.49.106506

Additional details

Identifiers

Publishing Information

Journal Title
Japanese Journal of Applied Physics
Journal Volume
49
Journal Issue
10
Journal Page Range
p. 106506.1-106506.5
ISSN
0021-4922

Optional Information

Notes
37 refs., 10 figs.