Published 1990
| Version v1
Book
Molecular dynamics simulations of ionized cluster beam deposition
Creators
- 1. Illinois Univ., Urbana, IL (USA). Dept. of Materials Science and Engineering
- 2. Materials Science Div., Argonne National Lab., Argonne, IL (USA)
Description
Fully dynamical computer simulations have been used to study the physical mechanisms of ionized cluster beam deposition. Clusters containing 92 atoms were directed at left-angle 001 right-angle surfaces with energies per cluster atom ranging from one sixth to three times the cohesive energy of the target. Simulation events employed wither Lennard-Jones or embedded atom method potentials. The atoms in the cluster appear to undergo local melting on impact with the substrate. Higher cluster energy increases the spreading of cluster atoms on the substrate and improves epitaxy, but it also increases interdiffusion and produces point defects
Additional details
Publishing Information
- Publisher
- Materials Research Society.
- Imprint Place
- Pittsburgh, PA (USA)
- ISBN
- 1-55899-045-3
- Imprint Title
- Beam-solid interactions, physical phenomena
- Imprint Pagination
- 872 p.
- Journal Page Range
- p. 283-286.
Conference
- Title
- physical phenomena.
- Acronym
- Conference on beam-solid interactions
- Dates
- 27 Nov - 2 Dec 1989.
- Place
- Boston, MA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22013409
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMS; CLUSTER BEAMS; COMPUTERIZED SIMULATION; CRYSTAL LATTICES; EPITAXY; MOLECULAR BEAMS; POINT DEFECTS; THIN FILMS
- Descriptors DEC
- BEAMS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; FILMS; SIMULATION
Optional Information
- Secondary number(s)
- CONF-8911139--.