Improvements in or relating to catalysts comprising a particulate substrate with a sputtered deposit of catalytic material

This invention is based upon the discovery that, if catalytic material is deposited by sputtering under carefully controlled conditions, it is possible to obtain catalytically active surface coatings for gas phase catalysis applications with very much smaller quantities of catalytic material than is possible by vapour deposition or deposition from solution. Furthermore, significantly greater activity per unit area of support can be achieved, as compared with catalytic material deposited by a conventional technique. (U.K.)