Published 1991 | Version v1
Book

The deposition of nickel boride thin films by borane and metallaborane cluster compounds

  • 1. Syracuse Univ., NY (United States). Dept. of Chemistry
  • 2. Syracuse Univ., NY (United States). Dept. of Physics

Description

This paper reports on the deposition of high purity and controlled stoichiometry metal boride thin-film materials. Borane clusters and their corresponding metal complexes are currently being investigated in our laboratories for their utility as unique source materials for the formation of metallic-boride thin films by MOCVD. Variable composition nickel boride thin films ranging from 0.1 micron to several microns have been prepared. These new materials have been characterized by SEM, AES, and XES. The magnetic properties of these new films have been investigated with torque magnetometry and magneto-optic Kerr effect magnetometry

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (United States)
ISBN
1-55899-096-8
Imprint Title
Chemical perspectives of microelectronic materials. 2
Imprint Pagination
584 p.
Journal Page Range
p. 439-441.

Conference

Title
Fall meeting of the Materials Research Society (MRS).
Dates
24 Nov - 1 Dec 1990.
Place
Boston, MA (United States).

Optional Information