The influence of preadsorbed K on the adsorption of PF3 on Ru(0001) studied by soft x-ray photoelectron spectroscopy
Creators
- 1. Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)
- 2. Department of Physics, University of California, Riverside, California 92521 (United States)
- 3. Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08855 (United States)
- 4. Surface and Interface Science Department, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
Description
Soft-x-ray photoelectron spectroscopy (SXPS) is utilized to study the coadsorption of K and PF3 on Ru(0001) at 90 and 300 K. In the absence of K, PF3 adsorbs molecularly at both temperatures. In the presence of a fractional monolayer of K, initially PF3 completely dissociates resulting in the formation of adsorbed KF and P species. As the surface is further exposed to PF3, some of the PF3 molecules adsorb via partial dissociation, resulting in the formation of PF and PF2. This process continues until all the K has reacted. At 300 K, a fraction of the incoming PF3 molecules react with the adsorbed KF and form a species which is tentatively identified as KPF6. The data show that surface chemistry is different at the two temperatures, as some of the chemical reaction channels occurring at 300 K are blocked at 90 K. The reduced surface mobility of the incident PF3 molecules at 90 K adversely affects the probability of PF3 and KF interactions, which, in turn, causes the concentration of adsorbed PF3 relative to P to be larger at lower temperatures
Additional details
Publishing Information
- Journal Title
- Journal of Chemical Physics
- Journal Volume
- 100
- Journal Issue
- 7
- Journal Page Range
- p. 5301-5313.
- ISSN
- 0021-9606
- CODEN
- JCPSA6
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 25046729
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ADSORPTION; CHEMICAL REACTIONS; DISSOCIATION; PHOSPHORUS; PHOSPHORUS FLUORIDES; PHOTOELECTRON SPECTROSCOPY; POTASSIUM; POTASSIUM FLUORIDES; RUTHENIUM; SOFT X RADIATION; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- ALKALI METAL COMPOUNDS; ALKALI METALS; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; IONIZING RADIATIONS; METALS; NONMETALS; PHOSPHORUS COMPOUNDS; PLATINUM METALS; POTASSIUM COMPOUNDS; RADIATIONS; SORPTION; SPECTROSCOPY; TEMPERATURE RANGE; TRANSITION ELEMENTS; X RADIATION