Published April 1, 1994 | Version v1
Journal article

The influence of preadsorbed K on the adsorption of PF3 on Ru(0001) studied by soft x-ray photoelectron spectroscopy

  • 1. Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)
  • 2. Department of Physics, University of California, Riverside, California 92521 (United States)
  • 3. Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08855 (United States)
  • 4. Surface and Interface Science Department, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)

Description

Soft-x-ray photoelectron spectroscopy (SXPS) is utilized to study the coadsorption of K and PF3 on Ru(0001) at 90 and 300 K. In the absence of K, PF3 adsorbs molecularly at both temperatures. In the presence of a fractional monolayer of K, initially PF3 completely dissociates resulting in the formation of adsorbed KF and P species. As the surface is further exposed to PF3, some of the PF3 molecules adsorb via partial dissociation, resulting in the formation of PF and PF2. This process continues until all the K has reacted. At 300 K, a fraction of the incoming PF3 molecules react with the adsorbed KF and form a species which is tentatively identified as KPF6. The data show that surface chemistry is different at the two temperatures, as some of the chemical reaction channels occurring at 300 K are blocked at 90 K. The reduced surface mobility of the incident PF3 molecules at 90 K adversely affects the probability of PF3 and KF interactions, which, in turn, causes the concentration of adsorbed PF3 relative to P to be larger at lower temperatures

Additional details

Publishing Information

Journal Title
Journal of Chemical Physics
Journal Volume
100
Journal Issue
7
Journal Page Range
p. 5301-5313.
ISSN
0021-9606
CODEN
JCPSA6