Synthesis of tantalum carbide thin films by ion beam enhanced deposition
Creators
- 1. Tsinghua University, Beijing (China). Department of Materials Science and Engineering
Description
Tantalum carbide thin films were synthesized by ion beam enhanced deposition at room-temperature. Tantalum and graphite targets were alternatively sputtered by Ar+ with the energy of 1.5 KeV and the co-sputtered thin films were simultaneously bombarded by 15 KeV Ar+. The arrival ratios of Ta and C atoms could be conveniently controlled by adjusting the time of sputtering of targets. AES showed that thin films were dependent on the arrival ratios of Ta and C atoms. In combination with X-ray diffraction, it was found that TaC, Ta2C and mixed phases of TaC and Ta2C could be controlled by varying the arrival ratios of Ta and C atoms. Knoop's hardness measurement showed that the hardness of TaC was about 1500 kg/mm2. (author). 13 refs.; 5 figs.; 1 tab
Additional details
Publishing Information
- Publisher
- North-Holland.
- Imprint Place
- Amsterdam (Netherlands)
- ISBN
- 0 444 89011 4
- Imprint Title
- C-MRS International 1990 symposia proceedings. V. 4. Thin films and beam-solid interactions
- Imprint Pagination
- 601 p.
- Journal Page Range
- p. 345-349.
Conference
- Title
- thin films, and H: laser and particle-beam interactions with solids of the C-MRS International 1990 Conference.
- Acronym
- Symposia I
- Dates
- 18-22 Jun 1990.
- Place
- Beijing (China).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 22081995
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DEPOSITION; ION BEAMS; SYNTHESIS; TANTALUM CARBIDES; THIN FILMS
- Descriptors DEC
- BEAMS; CARBIDES; CARBON COMPOUNDS; FILMS; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- This work was supported by the National Natural Science Foundation of China, and the Shanghai Institute of Metallurgy, Chinese Academy of Science. Imprint:C-MRS = Chinese Materials Research Society; Includes author index and subject index.