Published July 6, 2015 | Version v1
Journal article

Te-doping of self-catalyzed GaAs nanowires

  • 1. Optoelectronics Research Centre, Tampere University of Technology, FI-33101 Tampere (Finland)
  • 2. Department of Material Science, Tampere University of Technology, FI-33101 Tampere (Finland)
  • 3. Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany)

Description

Tellurium (Te)-doping of self-catalyzed GaAs nanowires (NWs) grown by molecular beam epitaxy is reported. The effect of Te-doping on the morphological and crystal structure of the NWs is investigated by scanning electron microscopy and high-resolution transmission electron microscopy. The study reveals that the lateral growth rate increases and axial growth rate decreases with increasing Te doping level. The changes in the NW morphology can be reverted to some extent by changing the growth temperature. At high doping levels, formation of twinning superlattice is observed alongside with the (111)-facetted sidewalls. Finally, the incorporation of Te is confirmed by Raman spectroscopy

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
107
Journal Issue
1
Journal Page Range
p. 012101-012101.4
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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