Published December 14, 2014 | Version v1
Journal article

Correlation between iron self-diffusion and thermal stability in doped iron nitride thin films

  • 1. UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452 001 (India)
  • 2. Jülich Centre for Neutron Science, Forschungszentrum Jülich GmbH, Outstation at MLZ Lichtenbergstrasse 1, 85747 Garching (Germany)
  • 3. Laboratory for Neutron Scattering, Paul Scherrer Institute, CH-5232 Villigen PSI (Switzerland)

Description

Nanocrystalline Fe-X-N thin films (with doping X = 0, 3.1 at. % Al, 1.6 at. % Zr), were deposited using reactive ion beam sputtering. Magnetization study reveals that the deposited films exhibit a perpendicular magnetic anisotropy. Thermal stability of the films was investigated systematically and it was observed that the structural and the magnetic stability gets significantly enhanced with Al doping, whereas Zr doping has only a marginal effect. Fe self-diffusion, obtained using polarized neutron reflectivity, shows a suppression with both additives. A correlation between the thermal stability and the diffusion process gives a direct evidence that the enhancement in the thermal stability is primarily diffusion controlled. A combined picture of diffusion, structural, and magnetic stability has been drawn to understand the obtained results

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
116
Journal Issue
22
Journal Page Range
p. 222206-222206.8
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

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