Published 1989 | Version v1
Journal article Metadata-only

Sputtering of Ni-P alloy in amorphous and crystalline states

Creators

Description

The process of sputtering of amorphous and crystal specimens of Ni80P20 alloy in case of irradiation by 7 keV H+ ions at the temperature of the specimens not exceeding 150 deg C was investigated. The composition of sputtered deposits was determined by the method of the Rutherford back scattering using 2.7 MeV He+ ions. It is ascertained that sputtering rate of amorphous specimens is 5.7 times lower than that of crystal ones. It is detected that irradiation decreases crystallization temperature of amorphous alloy

Additional details

Additional titles

Original title (Russian)
Исследование распыления сплава Ни-П в аморфном и кристаллическом состояниях

Publishing Information

Journal Title
Atomnaya Ehnergiya
Journal Volume
67
Journal Issue
2
Series
At. Ehnerg.
Journal Page Range
142-143
ISSN
0004-7163
CODEN
AENGA

INIS

Country of Publication
Russian Federation
Country of Input or Organization
USSR
INIS RN
21078349
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
AMORPHOUS STATE; CRYSTALLIZATION; HIGH TEMPERATURE; HYDROGEN IONS; KEV RANGE 01-10; NICKEL BASE ALLOYS; PHOSPHORUS ADDITIONS; PHYSICAL RADIATION EFFECTS; SPUTTERING
Descriptors DEC
ALLOYS; CHARGED PARTICLES; ENERGY RANGE; IONS; KEV RANGE; NICKEL ALLOYS; PHASE TRANSFORMATIONS; RADIATION EFFECTS