Published April 14, 2008
| Version v1
Journal article
Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography
Creators
- 1. School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)
- 2. EPPRA SAS, Villebon sur Yvette 91140 (France)
- 3. Keldysh Institute of Applied Mathematics RAS, Moscow 125047 (Russian Federation)
- 4. Institute of Laser Engineering, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871 (Japan)
Description
Extreme ultraviolet lithography semiconductor manufacturing requires a 13.5 nm light source. Laser-produced plasma emission from Sn V-Sn XIV ions is one proposed industry solution. The effect of laser pulse width and spatial profile on conversion efficiency is analyzed over a range of power densities using a two-dimensional radiative magnetohydrodynamic code and compared to experiment using a 1.064 μm, neodymium:yttrium aluminium garnet laser on a planar tin target. The calculated and experimental conversion efficiencies and the effects of self-absorption in the plasma edge are compared. Best agreement between theory and experiment is found for an 8.0 ns Gaussian pulse
Additional details
Identifiers
- DOI
- 10.1063/1.2906901;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 92
- Journal Issue
- 15
- Journal Page Range
- p. 151501-151501.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39112186
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ALUMINIUM OXIDES; EMISSION; EXTREME ULTRAVIOLET RADIATION; FERRITE GARNETS; LASER-PRODUCED PLASMA; LASERS; LIGHT SOURCES; MAGNETOHYDRODYNAMICS; NEODYMIUM; PLASMA PRODUCTION; POWER DENSITY; PULSES; SELF-ABSORPTION; SEMICONDUCTOR MATERIALS; SIMULATION; TIN; TWO-DIMENSIONAL CALCULATIONS; YTTRIUM COMPOUNDS
- Descriptors DEC
- ABSORPTION; ALUMINIUM COMPOUNDS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUID MECHANICS; HYDRODYNAMICS; MATERIALS; MECHANICS; METALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PLASMA; RADIATION SOURCES; RADIATIONS; RARE EARTHS; SORPTION; TRANSITION ELEMENT COMPOUNDS; ULTRAVIOLET RADIATION
Optional Information
- Notes
- (c) 2008 American Institute of Physics