Published 2009 | Version v1
Book

Electrochromic behavior of the α-WO3 thin films grown by thermal evaporation

  • 1. Applied Physics Department, Faculty of Technology and Engineering, M.S. University of Baroda, Vadodara (India)

Description

Amorphous tungsten trioxide (α-WO3) thin films were deposited by thermal evaporation on an ITO coated glass substrates held at room temperature. The electrochromic behavior of WO3 thin film was investigated using electrochemical technique with H+ ions intercalated/de-intercalated. The diffusion coefficient of the H+ ion in α-WO3 thin film was ∼10-13 - 10-14 cm2/sec. The transmittance of the α-WO3 thin film decreases with the increase in intercalation of ions and the coloration efficiency is 31 cm2/C and 37 cm2/C for 650 nm and 1000 nm wavelength, respectively. The α-WO3 thin films show faster switching responses with intercalated H+ ions for 650 nm wavelength. (author)

Part of:
Proceedings of the DAE solid state physics symposium. V. 54

Additional details

Publishing Information

Publisher
Manohar Chandnani
Imprint Place
Mumbai (India)
ISBN
978-81-8372-054-0
Imprint Title
Proceedings of the DAE solid state physics symposium. V. 54
Imprint Pagination
1210 p.
Journal Page Range
p. 449-450

Conference

Title
54. DAE solid state physics symposium
Dates
14-18 Dec 2009
Place
Vadodara (India)

INIS

Country of Publication
India
Country of Input or Organization
India
INIS RN
41068964
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHARGE DENSITY; ELECTROCHROMISM; OPACITY; THIN FILMS; TUNGSTEN OXIDES
Descriptors DEC
CHALCOGENIDES; ELECTRO-OPTICAL EFFECTS; FILMS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; REFRACTORY METAL COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS

Optional Information

Notes
5 refs., 4 figs., 1 tab.