Published April 1997 | Version v1
Journal article Metadata-only

Diffraction studies of optical strength in vanadium dioxide base interference structures

Creators

  • 1. Fiziko-Tekhnicheskij Inst. im. A.F. Ioffe RAN, Sankt-Peterburg (Russian Federation)

Description

Optical breakthrough phenomenon is studied using film interference vanadium oxide structures, their thickness being 900 A, with the help of 0.2-0.4 mm diameter laser He-Ne beam, used as probe. It is ascertained, that the threshold of optical damages makes up 76 ± 4 mJ/cm2. Interference vanadium oxide systems can be applied in laser radiation control elements

Additional details

Additional titles

Original title (Russian)
Difraktsionnye issledovaniya luchevoj prochnosti interferentsionnykh struktur na osnove dioksida vanadiya

Publishing Information

Journal Title
Zhurnal Tekhnicheskoj Fiziki
Journal Volume
67
Journal Issue
4
Journal Page Range
p. 88-91
ISSN
0044-4642
CODEN
ZTEFA3

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
30001466
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DIFFRACTION GRATINGS; INTERFERENCE; LASER RADIATION; OPTICAL PROPERTIES; THIN FILMS; VANADIUM OXIDES
Descriptors DEC
CHALCOGENIDES; ELECTROMAGNETIC RADIATION; FILMS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; TRANSITION ELEMENT COMPOUNDS; VANADIUM COMPOUNDS

Optional Information

Notes
7 refs., 3 figs.