Published September 2005 | Version v1
Journal article

Synchrotron radiation induced Si-H dissociation on H-Si(111)-1x1 surfaces studied by in situ monitoring in the undulator-scanning tunneling microscope system

  • 1. Institute for Molecular Science, Myodaiji, Okazaki 444-8585 (Japan)

Description

Irradiation effects of the synchrotron radiation (SR) have been investigated on the hydrogen terminated- (H-) Si (111) surfaces by using the undulator beam and the in situ scanning tunneling microscope (STM). The small protrusions (SPs) generated by the undulator beam irradiation were assigned to the rest atoms with missing H. From the observed relation among the SP density, photon energy of the undulator beam and the total photon flux, it has been concluded that the main mechanism of the Si-H bond dissociation by the undulator beam irradiation is valence electron excitations of the Si-H bond by incident photons

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Journal Volume
23
Journal Issue
5
Journal Page Range
p. 1364-1366
ISSN
0734-2101
CODEN
JVTAD6

Optional Information

Notes
(c) 2005 American Vacuum Society