Published 1992 | Version v1
Book Metadata-only

Optical and infrared spectroscopy of laser irradiated Bi implanted SiO2 glasses

Creators

  • 1. Materials Science and Engineering Dept., Vanderbilt Univ., Nashville, TN (United States)
  • 2. Physics Dept., Fisk Univ., Nashville, TN (United States)
  • 3. Solid State Div., Oak Ridge National Lab., Oak Ridge, TN (United States)

Description

In this paper optical and infrared reflection spectra for Bi-implanted high-purity silica are reported as a function of dose and 5eV laser irradiation. The extinction coefficient per ion and the reflectance spectra are dose dependent. Subsequent effects of laser irradiation are dependent upon Bi content and total number of laser pulses. Changes reported are attributed to two photothermal processes. One involving diffusion and desorption of Bi ions and annealing of defects, while the second is dominated by annealing

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (United States)
ISBN
1-55899-129-8
Imprint Title
Proceedings of the phase formation and modification by beam-solid interactions
Imprint Pagination
913 p.
Journal Page Range
p. 383-388.

Conference

Title
Annual fall meeting of the Materials Research Society.
Dates
2-6 Dec 1991.
Place
Boston, MA (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
24010301
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; BISMUTH IONS; DESORPTION; DIFFUSION; DOPED MATERIALS; DOSE RATES; EV RANGE 01-10; GLASS; INFRARED SPECTRA; ION IMPLANTATION; LASER RADIATION; PHYSICAL RADIATION EFFECTS; PULSES; SILICON OXIDES; VISIBLE SPECTRA
Descriptors DEC
CHALCOGENIDES; CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; ENERGY RANGE; EV RANGE; HEAT TREATMENTS; IONS; MATERIALS; OXIDES; OXYGEN COMPOUNDS; RADIATION EFFECTS; RADIATIONS; SILICON COMPOUNDS; SPECTRA

Optional Information

Secondary number(s)
CONF-911202--.