Ceramic buckling for determining the residual stress in thin films
Creators
- 1. Henry Royce Institute, Department of Materials, University of Manchester, Manchester, M13 9PL (United Kingdom)
- 2. Surface Engineering Group, Manchester Metropolitan University, Manchester, M1 5GD (United Kingdom)
- 3. Department of Engineering Physics, Polytechnique Montréal, Montreal, Canada, H3T 1J4 (Canada)
Description
A new technique for determination of residual stress in thin films and coatings has been presented. The method consists of focused ion beam milling to create a lamella of thin film, followed by analysis of stress driven buckling profile of undercut lamella (beam) to extract residual stress. The residual stresses in crystalline TiN and Al2O3 films, produced by reactive magnetron sputtering and thermal oxidation, respectively, have been successfully determined by this new technique and validated by conventional X-ray diffraction and photoluminescence piezospectroscopy techniques, respectively. This new technique successfully measures and tracks the evolution of residual stress in as-deposited and different thermally cycled amorphous SiAlN films induced by thermal mismatch or relieved via mechanical twinning in interlayer, where diffraction methods are not applicable, thereby evaluating the thermal cycling performance of amorphous SiAlN coatings for protection of Ti at high temperature.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.scriptamat.2021.113949Additional details
Identifiers
- DOI
- 10.1016/j.scriptamat.2021.113949;
- PII
- S1359646221002293;
Publishing Information
- Journal Title
- Scripta Materialia
- Journal Volume
- 201
- Journal Page Range
- vp.
- ISSN
- 1359-6462
- CODEN
- SCMAF7
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53123419
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; CERAMICS; DEPOSITS; DIFFRACTION METHODS; ION BEAMS; MAGNETRONS; OXIDATION; PHOTOLUMINESCENCE; RESIDUAL STRESSES; SAFETY; SPUTTERING; THERMAL CYCLING; THIN FILMS; TITANIUM NITRIDES; X-RAY DIFFRACTION
- Descriptors DEC
- ALUMINIUM COMPOUNDS; BEAMS; CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DIFFRACTION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EMISSION; EQUIPMENT; FILMS; LUMINESCENCE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; PNICTIDES; SCATTERING; STRESSES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2021 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.