Published October 13, 2011 | Version v1
Journal article

Phase equilibria of the Cu-Ni-Si system at 700 deg. C

  • 1. Science Center for Phase Diagrams and Materials Design and Manufacture, Central South University, Changsha, Hunan 410083 (China)
  • 2. State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan 410083 (China)

Description

Highlights: → The phase diagram of the Cu-Ni-Si system at 700 deg. C was measured for the first time. → The existence of the ternary compound τ1 reported in literature was confirmed. → A new compound τ2-Cu45.8Ni25Si29.2 with no solubility was observed for the first time. → The Ni2SiH compound was found to be stable at 700 deg. C in the ternary system by dissolving Cu. - Abstract: The phase equilibria at the isothermal section of the Cu-Ni-Si system at 700 deg. C were experimentally investigated. Thirty Cu-Ni-Si alloys were prepared by arc melting and annealed at 700 deg. C for 30 or 80 days, and examined with optical microscopy, X-ray diffraction, scanning electron microscopy with energy dispersive X-ray spectroscopy and electron probe microanalysis. Twelve three-phase regions were determined. The existence of the ternary compound τ1-Cu56.8-63Ni10.4-16.1Si26.6-27.3 reported in literature was confirmed and a new compound τ2-Cu45.8Ni25Si29.2 with nearly no homogeneity range was observed. The θ-Ni2Si compound, which exists above 820 deg. C in the binary Ni-Si system, was found to be stable at 700 deg. C and the composition range of Cu is 12.7-20.6 at.% Cu. The ternary solubilities of binary compounds were measured and noticeably the Cu56Si11 compound can dissolve Ni up to 21.9 at.%.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2011.07.106

Additional details

Identifiers

DOI
10.1016/j.jallcom.2011.07.106;
PII
S0925-8388(11)01619-7;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
509
Journal Issue
41
Journal Page Range
p. 9776-9781
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.